Invited Speakers

BALD 2016 Invited Speakers:

On the history of ALD and the VPHA project 
Riikka L. Puurunen, VTT Research Centre of Finland Ltd, Espoo, Finland

Recent advances in plasma-enhanced ALD of nitrides
Erwin Kessels, Department of Applied Physics, Eindhoven University of Technology,

Challenges, opportunities and new approaches in ALD process development
Mikko Ritala, Department of Chemistry, University of Helsinki, Finland

Deposition temperature induced conduction band changes in zinc tin oxide buffer layers for chalcogenide solar cells
Tobias Törndahl, Solid State Electronics, Uppsala University, Sweden

Recent Advances in ALD Technology
Emma Salmi, Beneq Oy, Finland

Progress in device from Molecular Layering to Atomic Layer Deposition worldwide technology
Viktor Drozd, Saint Petersburg State University, Russia

Monolayer deposition techniques developed for advanced nanoelectronic devices
Viktor Luchinin, St Petersburg Electrotechnical University ”LETI”, Russia

Atomic layer deposition of insulating and metal layers for MIM-stacks in resistive switched and ferroelectric memory applications
Andrey Markeev, Moscow Institute of Physics and Technology, Russia